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Etching characteristics of magnetic thin films by ion beam technique.

Authors

NO TAE HWAN; H. C. Lee; S. D. Kim; S. H. Han; H. J. Kim

Citation

Proceedings of the third international symposium on physics of magnetic materials (ISPMM 95), Seoul,, pp.417 - ?

URI

https://pubs.kist.re.kr/handle/201004/111980

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KIST Conference Paper > Others

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