KIST Library Institutional Repository

Growth and characterization of silicon nitride films by PECVD.

Authors

KANG KWANG NHAM; Lee Jung Il; J. H. Jo; Han Il Ki; Y. J. Lee

Citation

5th ICSFS, Brown U., Providence, USA, Aug. 13-17, 1990, pp.?

Keywords

silicon nitride films

URI

https://pubs.kist.re.kr/handle/201004/112637

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML