DSpace at KIST: Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)

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Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)

Title: Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)

Authors: D.Y.C. Lie; 송종한; M.-A. Nicolet; M.O. Tanner; S. Thomas; K.L. Wang

Issue Date: 1995-01

Publisher: Material Research Society Symposium Proceedings

Citation: VOL 379, 467-472

URI: https://pubs.kist.re.kr/handle/201004/11496

Appears in Collections:: KIST Publication > Conference Paper

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