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Etching characteristics of magnetic thin films by ion beam technique.

Title: Etching characteristics of magnetic thin films by ion beam technique.

Authors: 이환철; 김성동; 임상호; 한석희; 김희중; 강일구

Keywords: etching; magnetic thin film; ion beam technique; etch rate

Issue Date: 1995-10

Publisher: 한국자기학회지; Journal of Korean Magnetics Society

Citation: v. 5, no. 5, 538-542

URI: https://pubs.kist.re.kr/handle/201004/11556

ISSN: 1017-7701

Appears in Collections:: KIST Publication > Article

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