The interfacial layer effect on bi-stable resistive switching phenomenon in MnOx thin film
- Authors
- Yang, Min Kyu; Kim, Gun Hwan; Ju, Hyunsu; Lee, Jeon-Kook; Ryu, Han-Cheol
- Issue Date
- 2015-08-03
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.107, no.5
- Abstract
- Resistive switching behavior of MnOx thin films was comparatively investigated. Two different top electrode materials of Ti and Pt over the common MnOx/Pt structure showed significantly distinct electrical endurance characteristics. Various structural and electrical analyses revealed that the interfacial oxide layer associated with Ti in the Ti/MnOx/Pt structure affected the improved electrical endurance characteristic. Finally, an 8 x 8 crossbar array with 100 nm-width interconnection line was fabricated to confirm the scalability and the stability of the resistive switching performances in the Ti/MnOx/Pt structure. (C) 2015 AIP Publishing LLC.
- Keywords
- MEMORY; MEMORY; resistive switching; MnOx thin films; Ti electrode; Pt electrode; interfacial layer effect; crossbar array
- ISSN
- 0003-6951
- URI
- https://pubs.kist.re.kr/handle/201004/125136
- DOI
- 10.1063/1.4928249
- Appears in Collections:
- KIST Article > 2015
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