Significantly reduced leakage currents in organic thin film transistors with Mn-doped Bi2Ti2O7 high-k gate dielectrics

Authors
Cho, Kwang-HwanKang, Min-GyuJang, Ho WonShin, Hyun YongKang, Chong-YunYoon, Seok-Jin
Issue Date
2012-05
Publisher
WILEY-V C H VERLAG GMBH
Citation
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.5, pp.208 - 210
Abstract
We report the fabrication of organic thin-film transistors (OTFTs) with high-k gate dielectrics of Mn-doped Bi2Ti2O7 (BTO) films. 3% Mn-doped BTO films deposited on polymer substrates by pulsed laser deposition at room temperature exhibit low leakage currents of 2.1 x 10(8) A/cm2 at an applied electric field of 0.3 MV/cm, while undoped BTO films show much higher leakage currents of 4.3 x 10(4) A/cm2. Mn doping effectively reduces the number of oxygen vacancies in the films and improves the electrical properties. Low operation voltage and significantly reduced leakage currents are demonstrated in pentacene-based OTFTs with the Mn-doped BTO gate dielectrics. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Keywords
PULSED-LASER DEPOSITION; CHEMICAL SOLUTION DECOMPOSITION; ELECTRICAL-PROPERTIES; STRONTIUM-TITANATE; INSULATORS; PULSED-LASER DEPOSITION; CHEMICAL SOLUTION DECOMPOSITION; ELECTRICAL-PROPERTIES; STRONTIUM-TITANATE; INSULATORS; OTFT; high-k gate dielectrics; BiTiO; leakage currents
ISSN
1862-6254
URI
https://pubs.kist.re.kr/handle/201004/129320
DOI
10.1002/pssr.201206080
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KIST Article > 2012
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