Dc current transport behavior in amorphous GeSe films
- Authors
- Jeong, Doo Seok; Park, Goon-Ho; Lim, Hyungkwang; Hwang, Cheol Seong; Lee, Suyoun; Cheong, Byung-ki
- Issue Date
- 2011-03
- Publisher
- SPRINGER HEIDELBERG
- Citation
- APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.102, no.4, pp.1027 - 1032
- Abstract
- The dc electric conduction behavior of amorphous GeSe films sandwiched between the Pt bottom electrode and various counter electrodes (Pt, Cr, and Ti) was examined in a voltage as well as a time domain. The time domain investigation identified time-dependent resistance change and relaxation. The voltage domain analysis revealed that the current transport in these metal-insulator-metal junctions is probably attributed to bulk-limited band-conduction due to delocalized charge carriers.
- Keywords
- LEAKAGE CURRENTS; AC CONDUCTION; CHALCOGENIDE; DEPENDENCE; TEMPERATURE; MODEL; LEAKAGE CURRENTS; AC CONDUCTION; CHALCOGENIDE; DEPENDENCE; TEMPERATURE; MODEL; chalcogenide; dc conductivity
- ISSN
- 0947-8396
- URI
- https://pubs.kist.re.kr/handle/201004/130597
- DOI
- 10.1007/s00339-011-6283-6
- Appears in Collections:
- KIST Article > 2011
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