Dc current transport behavior in amorphous GeSe films

Authors
Jeong, Doo SeokPark, Goon-HoLim, HyungkwangHwang, Cheol SeongLee, SuyounCheong, Byung-ki
Issue Date
2011-03
Publisher
SPRINGER HEIDELBERG
Citation
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.102, no.4, pp.1027 - 1032
Abstract
The dc electric conduction behavior of amorphous GeSe films sandwiched between the Pt bottom electrode and various counter electrodes (Pt, Cr, and Ti) was examined in a voltage as well as a time domain. The time domain investigation identified time-dependent resistance change and relaxation. The voltage domain analysis revealed that the current transport in these metal-insulator-metal junctions is probably attributed to bulk-limited band-conduction due to delocalized charge carriers.
Keywords
LEAKAGE CURRENTS; AC CONDUCTION; CHALCOGENIDE; DEPENDENCE; TEMPERATURE; MODEL; LEAKAGE CURRENTS; AC CONDUCTION; CHALCOGENIDE; DEPENDENCE; TEMPERATURE; MODEL; chalcogenide; dc conductivity
ISSN
0947-8396
URI
https://pubs.kist.re.kr/handle/201004/130597
DOI
10.1007/s00339-011-6283-6
Appears in Collections:
KIST Article > 2011
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