Synthesis of Si Nanosheets by a Chemical Vapor Deposition Process and Their Blue Emissions

Authors
Kim, UngkilKim, IlsooPark, YongheeLee, Ki-YoungYim, Sang-YoupPark, Jae-GwanAhn, Hong-GyuPark, Seung-HanChoi, Heon-Jin
Issue Date
2011-03
Publisher
AMER CHEMICAL SOC
Citation
ACS NANO, v.5, no.3, pp.2176 - 2181
Abstract
We synthesized free-standing Si nanosheets (NSs) with a thickness of about <2 nm using a chemical vapor deposition process and studied their optical properties. The Si NSs were formed by the formation of frameworks first along six different < 110 > directions normal to [111], its zone axis, and then by filling the spaces between the frameworks along the < 112 > directions under high flow rate of processing gas. The Si NSs showed blue emission at 435 nm, and absorbance and photoluminescence (PL) excitation measurements indicate that enhanced direct band transition attributes to the emission. Time-resolved PL measurement, which showed PL emission at 435 nm and a radiative lifetime of 1.346 ns, also indicates the enhanced direct band gap transition in these Si NSs. These outcomes indicate that dimensionality of Si nanostructures may affect the band gap transition and, in turn, the optical properties.
Keywords
OPTICAL-PROPERTIES; SILICON NANOCRYSTALS; QUANTUM DOTS; CONFINEMENT; GROWTH; PHASE; GAS; OPTICAL-PROPERTIES; SILICON NANOCRYSTALS; QUANTUM DOTS; CONFINEMENT; GROWTH; PHASE; GAS; silicon; nanosheets; photoluminescence; ultrathin two-dimensional formation; enhanced direct band gap transition
ISSN
1936-0851
URI
https://pubs.kist.re.kr/handle/201004/130611
DOI
10.1021/nn103385p
Appears in Collections:
KIST Article > 2011
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