Rapid thermal annealing temperature dependence of noise properties in Au/n-GaAs Schottky diodes with embedded InAs quantum dots in asymmetric In0.2Ga0.8As wells

Authors
Arpatzanis, N.Hastas, N. A.Dimitriadis, C. A.Konstantinidis, G.Charitidis, C.Song, J. D.Choi, W. J.Lee, J. I.
Issue Date
2009-04
Publisher
WILEY-V C H VERLAG GMBH
Citation
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, v.246, no.4, pp.880 - 884
Abstract
The effect of rapid thermal annealing temperature on the trap properties of Au/n-GaAs Schottky diodes with embedded InAs quantum dots in asymmetric In0.2Ga0.8As wells have been investigated by capacitance-voltage (C -V) and low frequency noise (LFN) measurements in both reverse and forward bias regimes. The current noise spectra show 1/f behaviour and generation-recombination (g-r) noise, attributed to uniformly distributed traps in energy and to a discrete trap level in the energy band-gap of the GaAs capping layer, respectively. The experimental results show that the annealing temperature is closely related with the level of these noise sources. The apparent doping concentrations, calculated from the C -V characteristics, indicate that the density of trapping states near the buffer layer interface is increased as the annealing temperature increases. (c) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Keywords
layer; cap
ISSN
0370-1972
URI
https://pubs.kist.re.kr/handle/201004/132609
DOI
10.1002/pssb.200880580
Appears in Collections:
KIST Article > 2009
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE