Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films

Authors
Park, Hyeong-HoHa, Tae-JungPark, Hyung-HoKim, Tae SongHill, Ross H.
Issue Date
2008-09-30
Publisher
ELSEVIER SCIENCE BV
Citation
MATERIALS LETTERS, v.62, no.25, pp.4143 - 4145
Abstract
The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BIT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 degrees C were 16.0 and 10.1 mu C/cm(2), respectively. The Process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching. (C) 2008 Elsevier B.V. All rights reserved.
Keywords
INDUCTIVELY-COUPLED PLASMA; THIN-FILMS; CRYSTALLIZATION; ORIENTATION; TITANATE; INDUCTIVELY-COUPLED PLASMA; THIN-FILMS; CRYSTALLIZATION; ORIENTATION; TITANATE; ferroelectrics; fatigue; BLT film; direct-patterning; UV-irradiation
ISSN
0167-577X
URI
https://pubs.kist.re.kr/handle/201004/133142
DOI
10.1016/j.matlet.2008.06.027
Appears in Collections:
KIST Article > 2008
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