Improvement of the adhesion properties between copper and a polyimide film

Authors
Lee, Wook-JaeKim, Yoon-BaeJee, Kwang-KuLee, Woo-Young
Issue Date
2008-05
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.52, no.5, pp.1673 - 1676
Abstract
In this study, we investigated the adhesion properties of a NiCr(100 angstrom)/Cu(2000 angstrom) metal film on a PI film modified by Ar+O-2 Reactive ion etching (RIE) with various ion doses at an ion beam energy of 250 eV. The result for the contact angles of water indicates that the surface modification by Ar+O-2 RIE considerably decreases the contact angle from 68 degrees to 2 degrees at an ion dose of 1 x 10(18) ions/cm(2), which results in an increase by a factor of two in the surface energy. The XPS spectrum showed that C-O and C=O bonding, identified as functional groups on the modified PI surface, was increased by interaction between scissored unstable chains and reactive ions. As a result, the PI surfaces modified by Ar+O-2 RIE showed significant improvement in adhesion to overcoated metal films.
Keywords
SURFACE; ENERGY; IRRADIATION; PLASMA; SURFACE; ENERGY; IRRADIATION; PLASMA; RIE; hydrophilic group; tie layer; peel strength
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/133530
DOI
10.3938/jkps.52.1673
Appears in Collections:
KIST Article > 2008
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE