Hybrid integration of GaAs/AlGaAs in-plane-gate resonant tunneling and field effect transistors

Authors
Son, S. H.Kang, M. G.Hwang, S. W.Lee, J. I.Park, Y. J.Yu, Y. S.Ahn, D.
Issue Date
2008-04
Publisher
ELSEVIER SCIENCE BV
Citation
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, v.40, no.6, pp.2160 - 2162
Abstract
We report the fabrication and characterization of a planar-type resonant tunneling device-field effect transistor (RTD-FET) hybrid circuit. Our hybrid circuit utilizes in-plane-type gates, which can control the potential of the quantum RTD quantum dot (QD) and FET channel. Transport measurements through the fabricated RTD-FET hybrid circuit exhibited the shift of the negative differential resistance peaks both as functions of the RTD gate and the FET gate. The slope of the current contour plot showed that the coupling capacitance of the FET gate to the QD is 1/20 of that of the FET gate. Our hybrid circuit successfully showed multi-valued inverter characteristics. (C) 2007 Elsevier B.V. All rights reserved.
Keywords
CIRCUITS; CIRCUITS; hybrid circuit; quantum dot; negative differential resistance; in-plane gate
ISSN
1386-9477
URI
https://pubs.kist.re.kr/handle/201004/133600
DOI
10.1016/j.physe.2007.10.096
Appears in Collections:
KIST Article > 2008
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE