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dc.contributor.authorCho, Sung Ki-
dc.contributor.authorLee, Jong Kyun-
dc.contributor.authorKim, Soo-Kil-
dc.contributor.authorKim, Jae Jeong-
dc.date.accessioned2024-01-21T00:31:03Z-
dc.date.available2024-01-21T00:31:03Z-
dc.date.created2021-09-05-
dc.date.issued2007-10-
dc.identifier.issn1099-0062-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/134058-
dc.description.abstractThe addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society.-
dc.languageEnglish-
dc.publisherELECTROCHEMICAL SOC INC-
dc.subjectSUPERCONFORMAL ELECTRODEPOSITION-
dc.subjectELECTROMIGRATION RESISTANCE-
dc.subjectCOPPER-
dc.subjectSILVER-
dc.subjectMETALLIZATION-
dc.subjectSYSTEM-
dc.subjectFILM-
dc.titleAcceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects-
dc.typeArticle-
dc.identifier.doi10.1149/1.2769103-
dc.description.journalClass1-
dc.identifier.bibliographicCitationELECTROCHEMICAL AND SOLID STATE LETTERS, v.10, no.10, pp.D116 - D119-
dc.citation.titleELECTROCHEMICAL AND SOLID STATE LETTERS-
dc.citation.volume10-
dc.citation.number10-
dc.citation.startPageD116-
dc.citation.endPageD119-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000248659800016-
dc.identifier.scopusid2-s2.0-34547849607-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusSUPERCONFORMAL ELECTRODEPOSITION-
dc.subject.keywordPlusELECTROMIGRATION RESISTANCE-
dc.subject.keywordPlusCOPPER-
dc.subject.keywordPlusSILVER-
dc.subject.keywordPlusMETALLIZATION-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordPlusFILM-
dc.subject.keywordAuthorAg-
dc.subject.keywordAuthorElectrodeposition-
dc.subject.keywordAuthorCuCN-
dc.subject.keywordAuthorInterconnect-
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