Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, Sung Ki | - |
dc.contributor.author | Lee, Jong Kyun | - |
dc.contributor.author | Kim, Soo-Kil | - |
dc.contributor.author | Kim, Jae Jeong | - |
dc.date.accessioned | 2024-01-21T00:31:03Z | - |
dc.date.available | 2024-01-21T00:31:03Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2007-10 | - |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/134058 | - |
dc.description.abstract | The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society. | - |
dc.language | English | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.subject | SUPERCONFORMAL ELECTRODEPOSITION | - |
dc.subject | ELECTROMIGRATION RESISTANCE | - |
dc.subject | COPPER | - |
dc.subject | SILVER | - |
dc.subject | METALLIZATION | - |
dc.subject | SYSTEM | - |
dc.subject | FILM | - |
dc.title | Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects | - |
dc.type | Article | - |
dc.identifier.doi | 10.1149/1.2769103 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | ELECTROCHEMICAL AND SOLID STATE LETTERS, v.10, no.10, pp.D116 - D119 | - |
dc.citation.title | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.volume | 10 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | D116 | - |
dc.citation.endPage | D119 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000248659800016 | - |
dc.identifier.scopusid | 2-s2.0-34547849607 | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SUPERCONFORMAL ELECTRODEPOSITION | - |
dc.subject.keywordPlus | ELECTROMIGRATION RESISTANCE | - |
dc.subject.keywordPlus | COPPER | - |
dc.subject.keywordPlus | SILVER | - |
dc.subject.keywordPlus | METALLIZATION | - |
dc.subject.keywordPlus | SYSTEM | - |
dc.subject.keywordPlus | FILM | - |
dc.subject.keywordAuthor | Ag | - |
dc.subject.keywordAuthor | Electrodeposition | - |
dc.subject.keywordAuthor | CuCN | - |
dc.subject.keywordAuthor | Interconnect | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.