Formation of nitride film on amorphous ribbon using chemical vapor deposition

Abstract

Nitride film was deposited on amorphous ribbon using chemical vapor deposition (CVD) to increase skin resistivity of the amorphous ribbon. As-cast Fe73.5Si15.5B7Cu1Nb3 amorphous ribbon was heat-treated in NH3 atmosphere to deposit nitride film on the ribbon at temperatures ranging 773-873 K. The effect of not only NH3 atmosphere but also pre-existing thin oxide film on the surface of as-cast amorphous ribbon on the formation of nitride film was investigated. Thin nitride film of Fe-nitride and Si-nitride were created on the surface of ribbon through the nitriding process. (c) 2006 Elsevier B.V. All rights reserved.