Effects of annealing process on dielectric properties of (Ba,Sr)TiO3 thin films grown by RF magnetron sputtering

Authors
Ha, JYChoi, JWKang, CYKarmanenko, SFYoon, SJChoi, DJKim, HJ
Issue Date
2005-09
Publisher
JAPAN SOC APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, v.44, no.37-41, pp.L1196 - L1198
Abstract
Single phase thin films of (Ba0.5Sr0.5)TiO3 have been prepared by single target RF magnetron sputtering. Through post-annealing process in box furnace at 1100 degrees C for 1 h, we have been able to improve the dielectric properties; dielectric permittivity, dielectric loss, and tunability. The change in dielectric properties before and after post-annealing is attributed to the change in film strain and the contraction in film lattice.
Keywords
ELECTRICAL-PROPERTIES; ELECTRICAL-PROPERTIES; BST RF sputtering; ferroelectric; microwave; tunable devices
ISSN
0021-4922
URI
https://pubs.kist.re.kr/handle/201004/136172
DOI
10.1143/JJAP.44.L1196
Appears in Collections:
KIST Article > 2005
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