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dc.contributor.authorJeun, M. H.-
dc.contributor.authorLee, K. I.-
dc.contributor.authorLee, K. H.-
dc.contributor.authorKim, D. Y.-
dc.contributor.authorChang, J. Y.-
dc.contributor.authorShin, K. H.-
dc.contributor.authorHan, S. H.-
dc.contributor.authorHa, J. G.-
dc.contributor.authorLee, W. Y.-
dc.date.accessioned2024-01-21T07:09:08Z-
dc.date.available2024-01-21T07:09:08Z-
dc.date.created2021-09-02-
dc.date.issued2004-05-
dc.identifier.issn0304-8853-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/137648-
dc.description.abstractThe magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4 - 300 K. Both the films are found to exhibit very large MR, similar to 600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films. (C) 2003 Elsevier B. V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.titleMagnetoresistance behavior in electroplated and sputtered Bi thin films-
dc.typeArticle-
dc.identifier.doi10.1016/j.jmmm.2003.12.733-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.272, pp.E1455 - E1457-
dc.citation.titleJOURNAL OF MAGNETISM AND MAGNETIC MATERIALS-
dc.citation.volume272-
dc.citation.startPageE1455-
dc.citation.endPageE1457-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000202897200564-
dc.identifier.scopusid2-s2.0-23144441311-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordAuthormagnetotransport-
dc.subject.keywordAuthorordinary magnetoresistance-
dc.subject.keywordAuthorspin injection-
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