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dc.contributor.author윤영수-
dc.contributor.author김태송-
dc.contributor.author최원국-
dc.date.accessioned2024-01-21T07:35:35Z-
dc.date.available2024-01-21T07:35:35Z-
dc.date.created2022-01-10-
dc.date.issued2004-02-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/137857-
dc.titleStructural and Electrical properties of WOx Thin Films Deposited by Direct Current Reactive Sputtering for NOx Gas Sensor-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJournal of The Korean Ceramic Society, v.41, no.2, pp.97 - 101-
dc.citation.titleJournal of The Korean Ceramic Society-
dc.citation.volume41-
dc.citation.number2-
dc.citation.startPage97-
dc.citation.endPage101-
dc.subject.keywordAuthorWOx-
dc.subject.keywordAuthorSemiconductor type sensor-
dc.subject.keywordAuthorNox-
dc.subject.keywordAuthorSensitivity-
dc.subject.keywordAuthorThin film-
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KIST Article > 2004
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