DSpace at KIST: The effect of pulse plating on the current efficiency in trivalent chromium bath

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DC Field	Value	Language
dc.contributor.author	황경진	-
dc.contributor.author	안종관	-
dc.contributor.author	이만승	-
dc.contributor.author	오영주	-
dc.date.accessioned	2024-01-21T09:06:11Z	-
dc.date.available	2024-01-21T09:06:11Z	-
dc.date.created	2022-01-10	-
dc.date.issued	2003-04	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/138674	-
dc.title	The effect of pulse plating on the current efficiency in trivalent chromium bath	-
dc.title.alternative	3가크롬 도금욕에서 펄스도금조건이 전류효율에 미치는 영향	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	한국표면공학회지, v.36, no.2, pp.161 - 167	-
dc.citation.title	한국표면공학회지	-
dc.citation.volume	36	-
dc.citation.number	2	-
dc.citation.startPage	161	-
dc.citation.endPage	167	-
dc.subject.keywordAuthor	electroplating	-
dc.subject.keywordAuthor	pulsed current	-
dc.subject.keywordAuthor	trivalent chromium	-

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