Formation and characterization of self-patterned PZT film for applying to micro-mechanical detecting system
- Authors
- Ha, SM; Kim, WS; Park, HH; Kim, TS
- Issue Date
- 2002-03
- Publisher
- TAYLOR & FRANCIS LTD
- Citation
- FERROELECTRICS, v.273, pp.2729 - 2735
- Abstract
- One-layer self-patterned PZT film with 250 nm thickness was successfully fabricated using a photosensitive stock solution and UV-Irradiation process. Ethanol based-photosensitive stock solution having high molar concentration was prepared without any precipitation using diethanolamine (DEA) as stabilizer. A highly perpendicular edge shaped film was obtained through the self micro-patterning procedure. Especially the physical and electrical properties of self-patterned PZT films were compared with those of conventional PZT films. A highly densified microstructure with fine grains was obtained for both films but the self patterned one showed a highly (111) oriented microstructure. The remnant polarization of self-patterned film was slightly higher than that of conventionally processed film, however it showed a conventional and applicable ferroelectric properties.
- Keywords
- THIN-FILMS; THIN-FILMS; PZT; photosensitive; UV-irradiation; sol-gel
- ISSN
- 0015-0193
- URI
- https://pubs.kist.re.kr/handle/201004/139762
- Appears in Collections:
- KIST Article > 2002
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