Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors

Authors
Kim, HKSeong, TYLim, JHCho, WIYoon, YS
Issue Date
2001-12-15
Publisher
ELSEVIER
Citation
JOURNAL OF POWER SOURCES, v.102, no.1-2, pp.167 - 171
Abstract
The electrochemical and structural properties of cobalt oxide films which are deposited at different sputtering gas-ratios Of O-2/(Ar + O-2) are investigated. In order to examine the electrochemical properties of the as-deposited films, all solid-state thin-film. supercapacitors (TFSCs) are fabricated. There Consist Of Co3O4 electrodes and an amorphous LiPON thin-film electrolyte. It is shown that the capacitance behaviour of the Co3O4/LiPON/Co3O4 TFSCs is similar to bulk-type supercapacitor behaviour. It is further shown that the electrochemical behaviour of the TFSCs is dependent on the sputtering gas-ratios. The gas-ratio dependence of the capacitance of the oxide electrode films is discussed based on X-ray diffraction (XRD) and electrical results for the Co3O4 films. (C) 2001 Published by Elsevier Science B.V.
Keywords
IN-SITU; BEHAVIOR; NICO2O4; IN-SITU; BEHAVIOR; NICO2O4; thin-film; supercapacitor; Co3O4; LiPON electrolyte; gas-ratio; capacitance
ISSN
0378-7753
URI
https://pubs.kist.re.kr/handle/201004/139912
DOI
10.1016/S0378-7753(01)00864-3
Appears in Collections:
KIST Article > 2001
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