Visible photoluminescence from porous poly-Si/Si and amorphous-Si/Si structures
- Authors
- Kim, MG; Yun, Z; Lyou, J; Cho, S; Park, YJ; Kim, EK
- Issue Date
- 2001-06
- Publisher
- KOREAN PHYSICAL SOC
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.38, no.6, pp.750 - 753
- Abstract
- We performed visible photoluminescence and scanning electron micrograph measurements on several porous poly-Si/Si and a-Si/Si structures. We found that the porous interfacial layer between the thin film and the substrate determined the optoelectronic properties for the structures. With the results, we present a model for porous structures based on the quantum confinement effect in silicon wires; the decreasing emission intensity and the redshift of photoluminescence originate from the silicon wires in the porous interface formed during all electrochemical process.
- Keywords
- SILICON; TEMPERATURE; FABRICATION; WAFERS; FILMS; SILICON; TEMPERATURE; FABRICATION; WAFERS; FILMS; porous Si
- ISSN
- 0374-4884
- URI
- https://pubs.kist.re.kr/handle/201004/140450
- Appears in Collections:
- KIST Article > 2001
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