Visible photoluminescence from porous poly-Si/Si and amorphous-Si/Si structures

Authors
Kim, MGYun, ZLyou, JCho, SPark, YJKim, EK
Issue Date
2001-06
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.38, no.6, pp.750 - 753
Abstract
We performed visible photoluminescence and scanning electron micrograph measurements on several porous poly-Si/Si and a-Si/Si structures. We found that the porous interfacial layer between the thin film and the substrate determined the optoelectronic properties for the structures. With the results, we present a model for porous structures based on the quantum confinement effect in silicon wires; the decreasing emission intensity and the redshift of photoluminescence originate from the silicon wires in the porous interface formed during all electrochemical process.
Keywords
SILICON; TEMPERATURE; FABRICATION; WAFERS; FILMS; SILICON; TEMPERATURE; FABRICATION; WAFERS; FILMS; porous Si
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/140450
Appears in Collections:
KIST Article > 2001
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE