Strained InGaAs(P)/InP multi-quantum well structures grown by chemical-beam epitaxy
- Authors
- Woo, DH; Oh, MS; Koh, EH; Yahng, JS; Kim, SH; Kim, YD
- Issue Date
- 2000-05
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- MICROELECTRONIC ENGINEERING, v.51-2, pp.171 - 179
- Abstract
- We have carried out a double-crystal X-ray diffraction (DCXRD) study on ternary In1-xGaxAs/InP and quaternary In1-xGaxAsyP1-y/InP strained multi-quantum well (MQW) structures on (001) InP substrates grown by chemical beam epitaxy. The presence of well-defined higher-order harmonics in the DCXRD results and also the presence of intense and sharp peaks in the low- and room-temperature photoluminescence measurements confirm the high quality of strained MQW structures. This is further supported by the observation of defect-foe interfaces in transmission electron microscope photographs. By comparing the DCXRD measurements with X-ray simulation results, we could obtain layer thicknesses and profiles of perpendicular strains relative to the InP barrier. (C) 2000 Elsevier Science B.V. All rights reserved.
- Keywords
- X-RAY-DIFFRACTION; INTRINSIC STRAIN; SUPERLATTICES; CBE; INTERFACES; X-RAY-DIFFRACTION; INTRINSIC STRAIN; SUPERLATTICES; CBE; INTERFACES; strained layer; InGaAsP; CBE; DCXRD
- ISSN
- 0167-9317
- URI
- https://pubs.kist.re.kr/handle/201004/141433
- DOI
- 10.1016/S0167-9317(99)00470-0
- Appears in Collections:
- KIST Article > 2000
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.