A prediction method of temperature distribution on the wafer in a rapid thermal process system with multipoint sensing

Other Titles
고속 열처리 시스템에서 웨이퍼 상의 다중점 계측에 의한 온도 분포 추정 기법 연구
Authors
심영렬이석주민병조조영조김학배
Issue Date
2000-02
Publisher
대한전기학회
Citation
전기학회논문지 D = Transactions of the Korean Institute of Electrical Engneers, v.49, no.2, pp.62 - 67
Keywords
rapid thermal process; thermal modeling; tempertaure estimation; chamber geometry; run-by-run control
ISSN
1229-6287
URI
https://pubs.kist.re.kr/handle/201004/141592
Appears in Collections:
KIST Article > 2000
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