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The formation and phase analysis of Ni-Si diffusion layers formed by gas siliconizing of nickel

Other Titles

Ni의 gas siliconizing 에 의한 Ni-Si 확산층의 형성과 상분석

Authors

윤진국; 고흥석; 김재수; 최종술

Issue Date

1999-02

Publisher

대한금속학회

Citation

대한금속학회지, v.37, no.2, pp.211 - 219

Keywords

nickel

URI

https://pubs.kist.re.kr/handle/201004/142422

Appears in Collections:

KIST Article > Others

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