Effects of bottom electrode on the structural and electrical properties of PbTiO3 ferroelectric thin films
- Authors
- Lee, HN; Kim, YT; Choh, SH
- Issue Date
- 1997-01
- Publisher
- GORDON BREACH SCI PUBL LTD
- Citation
- FERROELECTRICS, v.197, no.1-4, pp.733 - 739
- Abstract
- The effect of RuOx and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO3 are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO3 films on RuOx and Pt are recrystallized along the [100] direction after annealing at 600 degrees C for 30min in O-2 ambient. The leakage current density for both samples are very similar, whereas the dielectric property of RuOx/PbTiO3 is superior to that of Pt/PbTiO3 due to the large grain growth of PbTiO3 on RuOx confirmed with cross-sectional transmission electron microscopy.
- ISSN
- 0015-0193
- URI
- https://pubs.kist.re.kr/handle/201004/143990
- Appears in Collections:
- KIST Article > Others
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.