METALLOGRAPHIC ETCHING OF POLYCRYSTALLINE DIAMOND FILMS BY REACTION WITH METAL

Authors
Lee, Wook SeongBaik, Young JoonEUN, KWANG YONGYOON, DY
Issue Date
1995-05
Publisher
ELSEVIER SCIENCE SA LAUSANNE
Citation
DIAMOND AND RELATED MATERIALS, v.4, no.7, pp.989 - 995
Abstract
It has been shown for the first time that the high-temperature annealing of a diamond film in contact with Mn and Fe can reveal the microstructural features within the film. The diamond film was annealed in contact with Mn and Fe at 900-1000 degrees C for 0.5-20 h. After annealing the sample was cleaned by acid and was rinsed in acetone. The cleaned surface was observed by scanning electron microscopy under a secondary electron mode. A clear image of the etch pattern appeared on the flattened diamond him surface from the reaction with the metals. The detailed microstructural features in the etch patterns were correlated to those on the as-grown surface. The image contrast in the etch pattern was related to the local defect density: the more defective region appeared darker. The origin of image contrast on the etched surface was discussed.
Keywords
ANNEALING; ETCHING; DIAMOND FILMS; DC PLASMA CVD
ISSN
0925-9635
URI
https://pubs.kist.re.kr/handle/201004/145100
DOI
10.1016/0925-9635(95)00271-5
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KIST Article > Others
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