KIST Library Institutional Repository

Effect of excess oxygen on the properties of reactive sputtered RuO//x thin films.

Authors

김용태; 이정건; 조성호; 민석기

Issue Date

1995-01

Citation

J. appl. phys., v.v. 77, pp.5473 - 5475

URI

https://pubs.kist.re.kr/handle/201004/145272

Appears in Collections:

KIST Article > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML