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Performance of the plasma deposited tungsten nitride barrier to prevent the interdiffusion of Al and Si.

Authors

이창우; 김용태; 이주천; Jeong Yong Lee; 민석기; 박영욱

Issue Date

1994-01

Publisher

American Institute of Physics

Citation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.12, pp.69 - 72

ISSN

1071-1023

URI

https://pubs.kist.re.kr/handle/201004/145763

Appears in Collections:

KIST Article > Others

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