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Structural properties of BaTiO3 thin films on Si grown by metalorganic chemical vapor deposition

Authors

염상섭; 윤영수; W. N. Kang; H. S. Shin; T. W. Kim; J. H. Lee; D. J. Choi; S. S. Back

Issue Date

1993-02

Citation

Journal of applied physics, v.73, no.3, pp.1547 - 1547

Keywords

thin films; BaTiO3; MOCVD

URI

https://pubs.kist.re.kr/handle/201004/146111

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KIST Article > Others

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