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SiH4 를 이용한 텅스텐 화학증착시 압력증가가 증착에 미치는 영향

Other Titles

The Effect of Pressure Increase on the Deposition of Tungsten by CVD using SiH4

Authors

박재현; 이정중; 금동화

Issue Date

1993-01

Publisher

한국표면공학회

Citation

한국표면공학회지, v.26, no.1, pp.3 - 9

ISSN

1225-8024

URI

https://pubs.kist.re.kr/handle/201004/146264

Appears in Collections:

KIST Article > Others

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