DSpace at KIST: Metalorganic chemical vapor deposition of BaTiO//3 thin films on Si.

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DC Field	Value	Language
dc.contributor.author	염상섭	-
dc.contributor.author	윤영수	-
dc.contributor.author	최상삼	-
dc.contributor.author	D. H. Lee	-
dc.date.accessioned	2024-01-21T23:31:07Z	-
dc.date.available	2024-01-21T23:31:07Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1992-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/146575	-
dc.title	Metalorganic chemical vapor deposition of BaTiO//3 thin films on Si.	-
dc.title.alternative	유기금속 화학기상증착법에 의한 Si 기판위의 BaTiO//3 박막증착 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	응용물리 = Korean appl. phys., v.v. 5, pp.193 - 197	-
dc.citation.title	응용물리 = Korean appl. phys.	-
dc.citation.volume	v. 5	-
dc.citation.startPage	193	-
dc.citation.endPage	197	-
dc.subject.keywordAuthor	thin films	-
dc.subject.keywordAuthor	BaTiO//3	-
dc.subject.keywordAuthor	MOCVD	-

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