DSpace at KISTKIST PublicationConference Paper

Characteristics of hydrogen ion implantation for SOI fabrication

Title
Characteristics of hydrogen ion implantation for SOI fabrication
Authors
김형권; 변영태; 김태곤; 김선호; 한상국
Keywords
SOI 제작; 수소 이온 주입; TRIM 시뮬레이터; RBS channeling spectrum
Issue Date
2003-07
Publisher
한국광학회 2003 년도 하계학술발표회
Citation
, 230-231
URI
https://pubs.kist.re.kr/handle/201004/14954
Appears in Collections:
KIST Publication > Conference Paper
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Full Item Record


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE