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Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment

Title: Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment

Authors: 차국헌; 주상현; 김수한; 심현상; 김용태; 한진희; 이진규; 윤도영

Keywords: low-k; MSQ; interconnection

Issue Date: 2001-05

Publisher: The Second Asian Conference on Chemical Vapor Deposition

Citation: , 48-51

URI: https://pubs.kist.re.kr/handle/201004/16430

Appears in Collections:: KIST Publication > Conference Paper

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