DSpace at KIST: Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists

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Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists

Title: Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists

Authors: 강종희; 신중한; 이재형; 김준우; 김종만; 한동근; 안광덕; 박재근; 문성윤; 문봉석

Issue Date: 1998-10

Publisher: 한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17.

Citation: , 249-249

URI: https://pubs.kist.re.kr/handle/201004/19129

Appears in Collections:: KIST Publication > Conference Paper

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