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Etching characteristics of magnetic thin films by ion beam technique.

Title
Etching characteristics of magnetic thin films by ion beam technique.
Authors
노태환; H. C. Lee; S. D. Kim; S. H. Han; H. J. Kim
Issue Date
1995-01
Publisher
Proceedings of the third international symposium on physics of magnetic materials (ISPMM 95), Seoul,
Citation
, 417-?
URI
https://pubs.kist.re.kr/handle/201004/20868
Appears in Collections:
KIST Publication > Conference Paper
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