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Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition

Title
Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition
Authors
김주영; 김효겸; 김양도; 김영도; 김원목; 전형탁
Keywords
diffusion barrier
Issue Date
2002-01
Publisher
Journal of the Korean Physical Society
Citation
VOL 40, NO 1, 176-179
URI
https://pubs.kist.re.kr/handle/201004/23559
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
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