Dependence of damage and strain on the temperature of Si irradiation in epitaxial Geㅊ.10Si0.90 films on Si(100)

Title
Dependence of damage and strain on the temperature of Si irradiation in epitaxial Geㅊ.10Si0.90 films on Si(100)
Authors
D.Y.C. Lie송종한A. VantommeF. EisenM.-A. NicoletN.D. TheodoreT. K. CarnsK.L. Wang
Issue Date
1995-03
Publisher
Journal of Applied Physics
Citation
VOL 77, NO 6, 2329-2338
URI
https://pubs.kist.re.kr/handle/201004/24610
ISSN
0021-8979
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE