DSpace at KISTKIST PublicationArticle

Advantage of rapid thermal annealing over furnace annealing for p-implanted metastable Si/Ge0.12Si0.88

Title
Advantage of rapid thermal annealing over furnace annealing for p-implanted metastable Si/Ge0.12Si0.88
Authors
D.Y.C. Lie; 송종한; M.-A. Nicolet; N.D. Theodore
Issue Date
1995-01
Publisher
Applied Physics Letters
Citation
VOL 66, NO 5, 592-594
URI
https://pubs.kist.re.kr/handle/201004/24624
ISSN
0003-6951
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Full Item Record


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE