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dc.contributor.authorAnkush Vij-
dc.contributor.authorAmanpal Singh-
dc.contributor.authorRavi Kumar-
dc.contributor.authorSanjeev Gautam-
dc.contributor.authorDinesh Kumar-
dc.contributor.author채근화-
dc.date.accessioned2015-12-03T00:58:32Z-
dc.date.available2015-12-03T00:58:32Z-
dc.date.issued201304-
dc.identifier.citationVOL 1536, 721-722-
dc.identifier.other39871-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/45118-
dc.description.abstractWe report the local electronic structure study of Zn0.8Mg0.2O thin films using x-ray absorption spectroscopy. The films were deposited on p-Si (100) substrates by sol-gel method and then annealed in O2 ambient for 1 hour. X-ray diffraction (XRD) confirmed the single phase wurtzite structure with a (002) preferred orientation. The near edge x-ray absorption fine structure (NEXAFS) spectrum collected at O K–edge indicates the presence of some oxygen vacancies in the film. The NEXAFS at Mg K-edge confirms the Mg doping into ZnO lattice. Zn L3-edge spectra feature reflects no Zn defect related features.-
dc.publisherAIP conference proceedings-
dc.subjectSol-gel-
dc.subjectX-ray diffraction-
dc.subjectX-ray absorption spectroscopy-
dc.titleNear edge X-ray absorption fine structure study of Zn0.8Mg0.2O thin films-
dc.typeConference Paper-
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