A robust design of Ru quantum dot/N-doped holey graphene for efficient Li-O-2 batteries

Title
A robust design of Ru quantum dot/N-doped holey graphene for efficient Li-O-2 batteries
Authors
김동익임희대Masoud Nazarian-SamaniSafa Haghighat-ShishavanHyun-Kyung KimYoungmin KoMyeong-Seong KimSuk-Woo LeeSeyed Farshid Kashani-BozorgMajid AbbasiHwan-Uk GuimKwang-Chul RohKisuk KangKwang-Bum Kim
Keywords
Battery; Graphene; quantum dot
Issue Date
2017-01
Publisher
Journal of materials chemistry. A, Materials for energy and sustainability
Citation
VOL 5, NO 2-631
Abstract
Herein, we report a simple, versatile, defect-engineered method to fabricate Ru quantum dots (Ru QDs) uniformly anchored on a nitrogen-doped holey graphene (NHG) monolith. It uses in situ pyrolysis of mixed glucose, dicyandiamide (DCDA), and RuCl3, followed by an acid treatment, and a final heat treatment to introduce in-plane holes of various sizes. A novel transmission method in scanning electron microscopy was successfully implemented to directly visualize the holes with color contrast. A low accelerating voltage of 5 kV enabled prolonged observation without significant electron beam damage. The mechanisms of hole creation were examined in detail using various characterization techniques as well as control experiments. The Ru QDs had significant catalytic activity and resulted in larger in-plane holes through the graphene sheets. The mechanical strain and the chemical reactivity of Ru QDs significantly diminished the activation energy barrier for the oxidation of C[double bond, length as m-dash]C bonds in the graphene structure. The Ru QD/NHG hybrid material was utilized as an electrocatalyst for the oxygen evolution reaction in Li– O2 batteries, showing much lower charge overpotentials compared to the bare NHG counterpart. The defect-laden holey graphene counterpart can be highly functionalized for multiple applications, leading to a new method of nanoengineering based on atomic scale defects.
URI
https://pubs.kist.re.kr/handle/201004/66502
ISSN
2050-7488
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KIST Publication > Article
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