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dc.contributor.author도정만-
dc.contributor.author홍경태-
dc.contributor.author윤진국-
dc.contributor.author김긍호-
dc.contributor.author최영준-
dc.contributor.author윤우영-
dc.date.accessioned2021-06-09T04:19:07Z-
dc.date.available2021-06-09T04:19:07Z-
dc.date.issued2017-12-
dc.identifier.citationVOL 129-114-
dc.identifier.issn0010-938X-
dc.identifier.other49843-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/66768-
dc.description.abstractIsothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000&#8211-
dc.description.abstract1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000&#8211-
dc.description.abstract1300 °C but opposite trend was observed at 1300&#8211-
dc.description.abstract1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.-
dc.publisherCorrosion science-
dc.subjectIntermetallics-
dc.subjectSEM-
dc.subjectTEM-
dc.subjectXRD-
dc.subjectOxidation-
dc.titleHigh temperature isothermal oxidation behavior of NbSi2 coating at 1000-1450 oC-
dc.typeArticle-
dc.relation.page102114-
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