High efficiency low threshold current 1.3 μm InAs quantum dot lasers on on-axis (001) GaP/Si
- High efficiency low threshold current 1.3 μm InAs quantum dot lasers on on-axis (001) GaP/Si
- 정대환; Justin Norman; M. J. Kennedy; Chen Shang; Bongki Shin; Yating Wan; Arthur C. Gossard; John E. Bowers
- Issue Date
- Applied physics letters
- VOL 111, 122107
- We demonstrate highly efficient, low threshold InAs quantum dot lasers epitaxially grown on onaxis (001) GaP/Si substrates using molecular beam epitaxy. Electron channeling contrast imaging measurements show a threading dislocation density of 7.3 106 cm2 from an optimized GaAs template grown on GaP/Si. The high-quality GaAs templates enable as-cleaved quantum dot lasers to achieve a room-temperature continuous-wave (CW) threshold current of 9.5 mA, a threshold current density as low as 132 A/cm2 , a single-side output power of 175 mW, and a wall-plug-efficiency of 38.4% at room temperature. As-cleaved QD lasers show ground-state CW lasing up to 80 C. The application of a 95% high-reflectivity coating on one laser facet results in a CW threshold current of 6.7 mA, which is a record-low value for any kind of Fabry-Perot laser grown on Si.
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