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dc.contributor.author안재평-
dc.contributor.author이지영-
dc.contributor.author김양희-
dc.contributor.author서종현-
dc.date.accessioned2021-06-09T04:26:00Z-
dc.date.available2021-06-09T04:26:00Z-
dc.date.issued2015-12-
dc.identifier.citationVOL 45, NO 4-213-
dc.identifier.issn2287-4445-
dc.identifier.other56401-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/72738-
dc.description.abstractNanomanipulators installed in focused ion beam (FIB), which is used in the lift-out of lamella when preparing transmission electron microscopy specimens, have recently been employed for electrical resistance measurements, tensile and compression tests, and in situ reactions. During the pick-up process of a single nanowire (NW), there are crucial problems such as Pt, C and Ga contaminations, damage by ion beam, and adhesion force by electrostatic attraction and residual solvent. On the other hand, many empirical techniques should be considered for successful pick-up process, because NWs have the diverse size, shape, and angle on the growth substrate. The most important one in the insitu precedence, therefore, is to select the optimum pick-up process of a single NW. Here we provide the advanced methodologies when manipulating NWs for in-situ mechanical and electrical measurements in FIB.-
dc.publisherApplied Micrscopy-
dc.titleAdvanced Methodologies for manipulating nanoscale features in focused ion beam-
dc.typeOther-
dc.relation.page208213-
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