High Hole Mobility and Low Leakage Thin-Body (In)GaSb p-MOSFETs Grown on High-Bandgap AlGaSb

Abstract

In this study, we demonstrated low leakage current and high mobility thin body (In)GaSb p-FETs. Through the optimization of the V/III ratio during the epitaxial growth, we achieved a highly insulating bottom Al 0.95 Ga 0.0 5 Sb barrier, which eliminates the junction leakage. We also suppressed the interface trap-assisted surface leakage current by introducing In 0.53 Ga 0.47 As surface passivation on the GaSb channel. Furthermore, GaSb/InGaSb/GaSb quantum well (QW) channel structure provided significant improvement in effective mobility ( μeff ) characteristics. As a result, the fabricated devices showed the lowest off-leakage current ( Ioff ), subthreshold slope ( S . S .) and high μeff among reported GaSb p-MOSFETs.