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Photoacid generating polymers based on sulfonyloxymaleimides and application as single-component resists.

Title
Photoacid generating polymers based on sulfonyloxymaleimides and application as single-component resists.
Authors
안광덕; 구재선; 정찬문
Keywords
N-(tosyloxy)maleimide
Issue Date
1996-01
Publisher
Journal of polymer science part A : polymer chemistry
Citation
v. 34, no. 2, 183-192
URI
https://pubs.kist.re.kr/handle/201004/7683
Appears in Collections:
KIST Publication > Article
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