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Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.

Title: Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.

Authors: 강문상; 임태훈

Issue Date: 1996-01

Publisher: 37th annual meeting of the division of plasma physics, American physicsl society, Kentucky, USA

Citation: v. 40, no. 11, 1696-?

URI: https://pubs.kist.re.kr/handle/201004/7695

Appears in Collections:: KIST Publication > ETC

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