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dc.contributor.authorD.Y.C. Lie-
dc.contributor.authorN.D. Theodore-
dc.contributor.author송종한-
dc.contributor.authorM.-A. Nicolet-
dc.date.accessioned2015-12-02T02:55:57Z-
dc.date.available2015-12-02T02:55:57Z-
dc.date.issued199505-
dc.identifier.citationVOL 77, NO 10, 5160-5166-
dc.identifier.issn0021-8979-
dc.identifier.other5097-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/7714-
dc.publisherJournal of Applied Physics-
dc.titleSolid-phase epitaxial regrowth and dopant activation of P-implanted metastable pseudomorphic Ge0.12Si0.88 on Si(100)-
dc.typeArticle-
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