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Characteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization

Title
Characteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization
Authors
김용태; H. S. Yoon; C. S. Kwon; H. N. Lee; J. Jang; 민석기
Issue Date
1995-01
Publisher
한국물리학회 제71회 학술논문발표회
URI
https://pubs.kist.re.kr/handle/201004/7744
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KIST Publication > Conference Paper
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