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Preparation of large area TiO2 thin films by low pressure chemical vapor deposition

Title
Preparation of large area TiO2 thin films by low pressure chemical vapor deposition
Authors
박달근; 전병수; 이중기; 신세희
Keywords
CVD; titanium dioxide; thin film
Issue Date
1994-01
Publisher
한국재료학회지
Citation
VOL 24, NO 8, 861-869
URI
https://pubs.kist.re.kr/handle/201004/7884
Appears in Collections:
KIST Publication > Article
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