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Thickness control of hexagonal boron nitride films for the utilization of gate-dielectric grown on silica substrate by chemical vapor deposition

Authors

Park, Jae hyun

Issue Date

2017-11-16

Publisher

한국재료학회

Citation

2017년도 한국재료학회 추계학술대회

URI

https://pubs.kist.re.kr/handle/201004/79470

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KIST Conference Paper > 2017

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